Dr. Jing Guo
at IBM Corp
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | October 3, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Semiconductors, Oxides, Electron beam lithography, Optical lithography, Etching, Polymers, Interfaces, Semiconductor materials, Silicon, Head-mounted displays

PROCEEDINGS ARTICLE | September 6, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Optical lithography, Calibration, Etching, Metals, Error analysis, Computer simulations, Directed self assembly, Extreme ultraviolet lithography, Critical dimension metrology, Process modeling

SPIE Journal Paper | July 31, 2018
JM3 Vol. 18 Issue 01
KEYWORDS: Etching, Optical lithography, Extreme ultraviolet, Head-mounted displays, Silicon, Chemistry, Amorphous silicon, Argon, Polymers, Interfaces

PROCEEDINGS ARTICLE | April 9, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Optical lithography, Etching, Polymers, Dielectrics, Chemistry, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | March 28, 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Oxides, Lithography, Etching, Metals, Dielectrics, Scanning electron microscopy, Directed self assembly, Critical dimension metrology, Tin, Back end of line

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Amorphous silicon, Optical lithography, Etching, Argon, Polymers, Interfaces, Silicon, Chemistry, Extreme ultraviolet, Head-mounted displays

Showing 5 of 10 publications
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