Dr. Jing Guo
Advisory Engineer/Scientist at IBM Corp
SPIE Involvement:
Profile Summary

Advisory Engineer/Scientist at IBM Research in Albany, NY since 2016. Research focus: semiconductor material and process technology. Currently working on advanced patterning for N7 and B7 technology enablement and patterning fundamental study, including materials performance improvement and novel patterning processes. Ph.D. in Chemistry from UMASS Amherst.
Publications (16)

Proceedings Article | 24 February 2021 Presentation + Paper
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII
KEYWORDS: Optical lithography, Etching, Scanners, Inspection, Extreme ultraviolet lithography, Source mask optimization, Photoresist processing, Semiconducting wafers, Stochastic processes, Resolution enhancement technologies

SPIE Journal Paper | 1 July 2020
JM3 Vol. 19 Issue 03
KEYWORDS: Stochastic processes, Fiber optic illuminators, Line edge roughness, Critical dimension metrology, Defect inspection, Extreme ultraviolet, Inspection, Optical lithography, Yield improvement

Proceedings Article | 17 April 2020 Presentation + Paper
Proc. SPIE. 11327, Optical Microlithography XXXIII
KEYWORDS: Logic, Optical lithography, Data modeling, Deep ultraviolet, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Optics manufacturing, Yield improvement

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Optical lithography, Etching, Inspection, Bridges, Extreme ultraviolet, Critical dimension metrology, Line edge roughness, Stochastic processes, Defect inspection

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
KEYWORDS: Optical lithography, Polymethylmethacrylate, Etching, Polymers, Ultraviolet radiation, Chemistry, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Defect inspection

Showing 5 of 16 publications
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