Efficient removal of SiO<sub>2</sub> contaminated particles from sol-gel SiO<sub>2</sub> filmed fused silica surface was achieved by single shot dry laser cleaning and airflow displacement system assisted laser cleaning using a Q switched Nd:YAG pulse laser at 355 nm in wavelength. The experiment result shows that for single-shot laser dry cleaning of sol-gel film fused silica samples under the condition of satisfying the theoretical cleaning threshold, the optimal laser energy density was 2.28 J/cm<sup>2</sup>, which is different from the process parameters of uncoated fused silica. In the optimal process parameters, single shot laser cleaning had obvious cleaning effect on SiO<sub>2</sub> particles with particle diameter larger than 1 μm, and the removal ratio was 64.81%. When the density of particle was too high, the cleaning effect was weakened and the damage to the substrate was caused. The re-attachment of crushed particles also leaded to making the cleaning effect worse. The airflow displacement system assisted laser cleaning method further enhanced the effect of removing the optical surface contaminated particles and the decontamination efficiency was improved to 80.53% at 1.71 J/cm<sup>2</sup>. Our results demonstrated that airflow displacement system will be useful for single shot dry laser cleaning of SiO<sub>2</sub> particles on an optical surface of fused silica.