Dr. Jinseok Heo
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Publications (5)

Proceedings Article | 10 April 2013 Paper
Proceedings Volume 8681, 86811D (2013) https://doi.org/10.1117/12.2011379
KEYWORDS: Semiconducting wafers, Overlay metrology, Scanners, Control systems, Process control, Instrument modeling, Lithography, Fourier transforms, Electronics, Semiconductors

SPIE Journal Paper | 1 October 2011
Jinseok Heo, Jeong-Ho Yeo, Young-Hee Kim
JM3, Vol. 10, Issue 04, 043011, (October 2011) https://doi.org/10.1117/12.10.1117/1.3658022
KEYWORDS: Scanners, Semiconducting wafers, Inspection, Calibration, Lithography, Image analysis, Spatial resolution, Scanning electron microscopy, Imaging systems, Overlay metrology

Proceedings Article | 20 April 2011 Paper
Jinseok Heo, Jeong-Ho Yeo, Younghee Kim
Proceedings Volume 7971, 79711C (2011) https://doi.org/10.1117/12.879802
KEYWORDS: Semiconducting wafers, Scanners, Inspection, Spatial resolution, Calibration, Optical fiber cables, Image resolution, Image enhancement, Scanning electron microscopy, Radon

Proceedings Article | 24 March 2009 Paper
Jeong-Ho Yeo, Byeong-Ok Cho, Jin-Hong Park, Jinseok Hur, Seok-Hoon Woo, Seungwoon Choi, Chan-Hoon Park
Proceedings Volume 7272, 72721U (2009) https://doi.org/10.1117/12.814024
KEYWORDS: Critical dimension metrology, Polarization, Semiconducting wafers, Inspection, Reflectivity, Silicon, Calibration, Process control, Denoising, Associative arrays

Proceedings Article | 23 March 2009 Paper
Proceedings Volume 7272, 72721S (2009) https://doi.org/10.1117/12.813995
KEYWORDS: Photomasks, Semiconducting wafers, Inspection, Critical dimension metrology, Error analysis, Diffraction, Scanners, Printing, Fiber optic illuminators, Charge-coupled devices

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