J. J. Lei
at Mentor, a Siemens Business
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 31 March 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Visualization, Matrices, Computer simulations, 3D modeling, Photomasks, Optical proximity correction, Convolution, Feedback control, Semiconducting wafers, Model-based design

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