Dr. Jackie Cheng Profile

Dr. Jackie Cheng

RD Manager at Photronics DNP Mask Corp

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Author

Publications (6)

Proceedings Article | 26 September 2019 Paper

Characterization of quartz etched depth and optical density of opaque pattern for the wafer CD behavior on advanced mask

William Chou, Jeffrey Cheng, C. Twu, Adder Lee, Chih Hsuan Chao, Xin Ren Yu, Po Tsang Chen, Edgar Huang, Junjin Lin, Sweet Chen, James Cheng, Colbert Lu, Josh Tzeng, Jackie Cheng, Heng Jen Lee, Young Ham

Proceedings Volume 11148, 111481I (2019) https://doi.org/10.1117/12.2537938

KEYWORDS: Quartz, Photomasks, Critical dimension metrology, Semiconducting wafers, 3D metrology, Immersion lithography, Etching, Lithography, Binary data

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Proceedings Article | 3 October 2018 Paper

Hotspot analysis and empirical correction through mask and wafer technology harmonization

Yohan Choi, William Chou, Jeffrey Cheng, C. H. Twu, Adder Lee, Chih Hsuan Chao, Hsin Fu Chou, Sweet Chen, James Cheng, Colbert Lu, Josh Tzeng, Jackie Cheng, Hong Jen Lee, Michael Green, Mohamed Ramadan, Young Ham, Chris Progler

Proceedings Volume 10810, 108101K (2018) https://doi.org/10.1117/12.2501427

KEYWORDS: Optical proximity correction, Photomasks, Lithography

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Proceedings Article | 16 October 2017 Paper

Process window discovery from mask inspection for hotspot analysis and verification

James Cheng, William Chou, C. Twu, Hsin-Fu Chou, Jackie Cheng, Colbert Lu, Heng-Jen Lee, Bosheng Zhang, Mehdi Daneshpanah, Apo Sezginer, David Wu, Mike Yeh, Albert Chien

Proceedings Volume 10451, 104510X (2017) https://doi.org/10.1117/12.2281215

KEYWORDS: Photomasks, Inspection, Scanning electron microscopy, Lithography, 3D modeling, Near field, Photoresist materials, Semiconducting wafers

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Proceedings Article | 12 December 2009 Paper

Implementation of new recticle inspection technology for progressive mask defect detection strategy on memory fab

Andy Lan, Jenny Hsu, Todd T. Shih, Toroy Tien, Jackie Cheng, Mike Yeh, Ellison Chen, David Wu

Proceedings Volume 7520, 752026 (2009) https://doi.org/10.1117/12.837028

KEYWORDS: Inspection, Photomasks, Reticles, Air contamination, Semiconducting wafers, Defect detection, Optical proximity correction, SRAF, Image transmission, Sensors

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Proceedings Article | 20 October 2006 Paper

Study of chromeless mask quartz defect detection capability for 80-nm post structure

Jerry Lu, Boster Wang, Frank Chen, Orion Wang, Jomarch Chou, Orson Lin, Jackie Cheng, Ellison Chen, Paul Yu

Proceedings Volume 6349, 63493K (2006) https://doi.org/10.1117/12.685660

KEYWORDS: Inspection, Photomasks, Defect detection, Quartz, Semiconducting wafers, Reticles, Lithography, Chromium, Resolution enhancement technologies, Manufacturing

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Proceedings Article | 4 November 2005 Paper

Process window impact of progressive mask defects: its inspection and disposition techniques (go/no-go criteria) via a lithographic detector

Jerry Huang, Lan-Hsin Peng, Chih-Wei Chu, Kaustuve Bhattacharyya, Ben Eynon, Farzin Mirzaagha, Tony Dibiase, Kong Son, Jackie Cheng, Ellison Chen, Den Wang

Proceedings Volume 5992, 599206 (2005) https://doi.org/10.1117/12.632039

KEYWORDS: Photomasks, Sensors, Inspection, Lithography, Semiconducting wafers, Defect inspection, Defect detection, Crystals, Detector development, Deep ultraviolet

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Showing 5 of 6 publications

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