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Jackie Yu
Staff Engineer at Tokyo Electron America Inc
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Publications (3)
Proceedings Article | 24 May 2004 Paper
Characterization of integrated optical CD for process control
Jackie Yu, Junichi Uchida, Youri van Dommelen, Rene Carpaij, Shaunee Cheng, Ivan Pollentier, Anita Viswanathan, Lawrence Lane, Kelly Barry, Nickhil Jakatdar
Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.535949
KEYWORDS: Critical dimension metrology, Metrology, Semiconducting wafers, Process control, Cadmium, Integrated optics, Finite element methods, Scatterometry, Wafer-level optics, Semiconductors
Proceedings Article | 24 May 2004 Paper
Metrology exposure-induced resist and ARC damage
Jackie Yu, Anita Viswanathan, Mokoto Miyagi, Junichi Uchida, Lawrence Lane, Kelly Barry, Machi Kajitani, Toshihiko Kikuchi, K. Chan, Fred Stanke
Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.534373
KEYWORDS: Metrology, Optical filters, Reflectivity, Silicon, Critical dimension metrology, Semiconducting wafers, Process control, Ultraviolet radiation, Photoresist materials, Scatterometry
Proceedings Article | 29 April 2004 Paper
In-line lithography cluster monitoring and control using integrated scatterometry
Ivan Pollentier, Shaunee Cheng, Bart Baudemprez, David Laidler, Youri van Dommelen, Rene Carpaij, Jackie Yu, Junichi Uchida, Anita Viswanathan, Doris Chin, Kelly Barry, Nickhil Jakatdar
Proceedings Volume 5378, (2004) https://doi.org/10.1117/12.537384
KEYWORDS: Critical dimension metrology, Semiconducting wafers, Lithography, Metrology, Scatterometry, Process control, 193nm lithography, Control systems, Finite element methods, Time metrology
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