Prof. Jacky Huang
Technical Manager at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Author
Publications (20)

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Diffraction, Metrology, Optical lithography, Image registration, Scatterometry, Optical metrology, Time metrology, Process control, High volume manufacturing, Target acquisition, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Diffraction, Metrology, Etching, Scanners, Process control, Semiconducting wafers, Overlay metrology, Back end of line, Front end of line

PROCEEDINGS ARTICLE | April 5, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Metrology, Image processing, Quality measurement, Image quality, Process control, Artificial intelligence, Optical alignment, Semiconducting wafers, Tolerancing, Overlay metrology

PROCEEDINGS ARTICLE | April 3, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Lithography, Diffraction, Reticles, Metrology, Physics, Scatterometry, Semiconducting wafers, Overlay metrology, Standards development, Diffraction gratings

PROCEEDINGS ARTICLE | April 20, 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Lithography, Light sources, Metrology, Scanners, Electron microscopes, Transmission electron microscopy, Very large scale integration, Critical dimension metrology, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 29, 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Lithography, Metrology, Optical lithography, Scanners, Time metrology, Process control, Feedback control, Semiconducting wafers, Overlay metrology, Tin

Showing 5 of 20 publications
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