Jacob Sitterly
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Publications (3)

PROCEEDINGS ARTICLE | March 27, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Spectroscopy, Molecules, Hydrogen, Chromium, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Carbon monoxide, Antimony

PROCEEDINGS ARTICLE | March 27, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Metals, Chromium, Photoresist materials, Extreme ultraviolet, Bismuth, Extreme ultraviolet lithography, Semiconducting wafers, Carbon monoxide, Antimony, Tellurium

PROCEEDINGS ARTICLE | March 31, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Metals, Spectroscopy, Photons, Molecules, Electrons, Hydrogen, Manufacturing, Photoresist materials, Polymerization, Extreme ultraviolet, Extreme ultraviolet lithography, Chemical elements, Semiconducting wafers, Antimony

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