Jacob R. Zeuske
Research Assistant at Univ of Wisconsin-Madison
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 27 May 2009 Paper
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Lithography, Reticles, Interferometers, Photography, Interferometry, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Beam expanders, Computer aided design

Proceedings Article | 18 March 2009 Paper
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Semiconductors, Reticles, Particles, Dielectrics, Photography, Fourier transforms, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Protactinium

Proceedings Article | 2 May 2008 Paper
Proc. SPIE. 6792, 24th European Mask and Lithography Conference
KEYWORDS: Mathematical modeling, Reticles, Data modeling, Photography, Interferometry, Control systems, 3D modeling, Image quality, Photomasks, Extreme ultraviolet lithography

Proceedings Article | 30 October 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Semiconductors, Reticles, Lithographic illumination, Mechanics, Interferometry, Kinematics, 3D modeling, Photomasks, Extreme ultraviolet lithography, Standards development

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