Dr. Jacque Georger
at SUNY Poly SEMATECH
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 7 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Optical lithography, Etching, Image processing, Scanning electron microscopy, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing, Semiconducting wafers

Proceedings Article | 18 March 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Optical lithography, Etching, Polymers, Glasses, Manufacturing, Resistance, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Photoresist processing

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Photons, Diffusion, Quantum efficiency, Photoresist materials, Extreme ultraviolet, Absorbance, Extreme ultraviolet lithography, Line edge roughness, Semiconducting wafers, Absorption

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Optical lithography, Manufacturing, Electroluminescence, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing, Semiconducting wafers

Proceedings Article | 24 August 2001
Proc. SPIE. 4345, Advances in Resist Technology and Processing XVIII
KEYWORDS: Lithography, Deep ultraviolet, Image processing, Ions, Silicon, Reflectivity, Photoresist materials, Photomasks, Photoresist processing, Photoresist developing

Proceedings Article | 11 June 1999
Proc. SPIE. 3678, Advances in Resist Technology and Processing XVI
KEYWORDS: Signal to noise ratio, Lithography, Reticles, Deep ultraviolet, Polymers, Manufacturing, Photoresist materials, Bridges, Temperature metrology, Phase shifts

Showing 5 of 10 publications
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