Dr. Jacques C.J. van der Donck
Senior Scientist/Particle Contamination at TNO
SPIE Involvement:
Author
Publications (14)

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Defect detection, Scattering, Scanners, Particles, Scanning electron microscopy, Scatterometry, Optical metrology, Semiconducting wafers, Signal detection

PROCEEDINGS ARTICLE | June 26, 2017
Proc. SPIE. 10329, Optical Measurement Systems for Industrial Inspection X
KEYWORDS: Wafer-level optics, Reticles, Metrology, Optical spheres, Defect detection, Speckle, Scanners, Particles, Silicon, Optical microscopy, Manufacturing, Inspection, Atomic force microscopy, Scanning electron microscopy, Latex, Semiconducting wafers, Signal detection, Particle contamination, Contamination control, Defect inspection

PROCEEDINGS ARTICLE | March 8, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Reticles, Metrology, Deep ultraviolet, Imaging systems, Scattering, Cameras, Particles, Silicon, Inspection, Scatterometry, Objectives, Extreme ultraviolet, Particle systems, Fiber optic handling equipment

PROCEEDINGS ARTICLE | June 21, 2015
Proc. SPIE. 9526, Modeling Aspects in Optical Metrology V
KEYWORDS: Mirrors, Contamination, Scattering, Sensors, Nanoparticles, Particles, Light scattering, Laser scattering, Interference (communication), Signal detection

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Lithography, Reticles, Contamination, Particles, Robotics, Inspection, Extreme ultraviolet, Extreme ultraviolet lithography, Particle contamination, Atmospheric particles

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Mirrors, Prisms, Reticles, Scattering, Scanners, Particles, Light scattering, Inspection, Speckle pattern, Extreme ultraviolet lithography

Showing 5 of 14 publications
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