Dr. Jacques C.J. van der Donck
Senior Scientist/Particle Contamination at TNO
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Defect detection, Scattering, Scanners, Particles, Scanning electron microscopy, Scatterometry, Optical metrology, Semiconducting wafers, Signal detection

Proceedings Article | 26 June 2017
Proc. SPIE. 10329, Optical Measurement Systems for Industrial Inspection X
KEYWORDS: Wafer-level optics, Reticles, Metrology, Optical spheres, Defect detection, Speckle, Scanners, Particles, Silicon, Optical microscopy, Manufacturing, Inspection, Atomic force microscopy, Scanning electron microscopy, Latex, Semiconducting wafers, Signal detection, Particle contamination, Contamination control, Defect inspection

Proceedings Article | 8 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Reticles, Metrology, Deep ultraviolet, Imaging systems, Scattering, Cameras, Particles, Silicon, Inspection, Scatterometry, Objectives, Extreme ultraviolet, Particle systems, Fiber optic handling equipment

Proceedings Article | 21 June 2015
Proc. SPIE. 9526, Modeling Aspects in Optical Metrology V
KEYWORDS: Mirrors, Contamination, Scattering, Sensors, Nanoparticles, Particles, Light scattering, Laser scattering, Interference (communication), Signal detection

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Lithography, Reticles, Contamination, Particles, Robotics, Inspection, Extreme ultraviolet, Extreme ultraviolet lithography, Particle contamination, Atmospheric particles

Showing 5 of 14 publications
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