Dr. Jae Uk Lee
Post doctor at IMEC
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 21 March 2019
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Metrology, Optical lithography, Visualization, Metals, Manufacturing, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Optical proximity correction

Proceedings Article | 20 March 2019
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Lithography, Optical lithography, Etching, Metals, Error analysis, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Stochastic processes

Proceedings Article | 23 April 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Scattering, Scanners, Particles, Silicon, Hydrogen, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 20 March 2018
Proc. SPIE. 10588, Design-Process-Technology Co-optimization for Manufacturability XII
KEYWORDS: Lithography, Logic, Optical lithography, Metals, Manufacturing, Extreme ultraviolet, Extreme ultraviolet lithography, New and emerging technologies, Back end of line

Proceedings Article | 16 October 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Logic, Optical lithography, Metals, Manufacturing, Photomasks, Extreme ultraviolet, Optical proximity correction, SRAF, Data conversion, Semiconducting wafers

Proceedings Article | 28 March 2017
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Lithography, Etching, Metals, Dielectrics, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Immersion lithography, Source mask optimization, Optical proximity correction, Line edge roughness

Showing 5 of 14 publications
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