Dr. Jae-Chang Jung
Senior Engineer at Hynix Semiconductor Inc
SPIE Involvement:
Conference Program Committee | Author
Publications (40)

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Monochromatic aberrations, Contamination, Polymers, Particles, Coating, Photoresist materials, Solids, Excimer lasers, Semiconducting wafers

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Antireflective coatings, Polymers, Photoresist materials, Bridges, Immersion lithography, Fluorine, Semiconducting wafers, Resolution enhancement technologies, Liquids

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Optical lithography, Etching, Silicon, Coating, Reflectivity, Photomasks, Extreme ultraviolet, Neodymium

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Lithographic illumination, Etching, Image processing, Electroluminescence, Photomasks, Optical proximity correction, Photoresist processing, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Optical lithography, Electrodes, Polymers, Diffusion, Resistance, Photoresist materials, Optical proximity correction, Semiconducting wafers, Quenching (fluorescence)

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Etching, Dry etching, Polymers, Glasses, Resistance, Electroluminescence, Photoresist materials, Photomasks, Critical dimension metrology, Adhesives

Showing 5 of 40 publications
Conference Committee Involvement (3)
Advances in Resist Technology and Processing XXII
28 February 2005 | San Jose, California, United States
Advances in Resist Technology and Processing XXI
23 February 2004 | Santa Clara, California, United States
Advances in Resist Technology and Processing XX
24 February 2003 | Santa Clara, California, United States
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