Ms. Jae-Cheon Shin Profile

Jae-Cheon Shin

at SK Hynix Inc

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Author

Publications (6)

Proceedings Article | 29 October 2014 Paper

A method of utilizing AIMS to quantify lithographic performance of high transmittance mask

Chun Seon Choi, Dong Sik Jang, Sung Hyun Oh, Jae Cheon Shin, Byungho Nam, Tae Joong Ha, Sang Pyo Kim, Dong Gyu Yim

Proceedings Volume 9235, 92351R (2014) https://doi.org/10.1117/12.2066283

KEYWORDS: Photomasks, Transmittance, Semiconducting wafers, Nanoimprint lithography, Lithography, Binary data, Chromium, Etching, Image analysis, Extreme ultraviolet

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Proceedings Article | 26 May 2010 Paper

New critical dimension uniformity measurement concept based reticle inspection tool

Kangjoon Seo, MunSik Kim, Sang Chul Kim, JaeCheon Shin, ChangYeol Kim, John Miller, Aditya Dayal, Trent Hutchinson, KiHun Park

Proceedings Volume 7748, 77480N (2010) https://doi.org/10.1117/12.864109

KEYWORDS: Photomasks, Reticles, Inspection, Critical dimension metrology, Reflectivity, Semiconducting wafers, Scanning electron microscopy, Manufacturing, Data processing, Scanners

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Proceedings Article | 30 October 2007 Paper

The advanced mask CD MTT control using dry etch process for sub 65 nm tech

Sang Jin Jo, Ho Yong Jung, Dong Wook Lee, Jae Cheon Shin, Jea Young Jun, Tae Joong Ha, Oscar Han

Proceedings Volume 6730, 673008 (2007) https://doi.org/10.1117/12.746646

KEYWORDS: Etching, Chromium, Dry etching, Critical dimension metrology, Photomasks, Reliability, Electron beams, Scanning electron microscopy, Process control, Semiconductors

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Proceedings Article | 20 October 2006 Paper

Mask CD correction method using dry-etch process

Ho Yong Jung, Tae Joong Ha, Jae Cheon Shin, Ku Cheol Jeong, Young Kee Kim, Oscar Han

Proceedings Volume 6349, 63490B (2006) https://doi.org/10.1117/12.686537

KEYWORDS: Critical dimension metrology, Chromium, Etching, Dry etching, Photoresist processing, Photomasks, Reliability, Scanning electron microscopy, Phase shifts, Electron beam lithography

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Proceedings Article | 20 August 2004 Paper

Spin stream develop process for ZEP resist

Jaecheon Shin, Tae-Joong Ha, Bo-Kyung Choi, Oscar Han

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557710

KEYWORDS: Photomasks, Photoresist processing, Critical dimension metrology, Manufacturing, Semiconducting wafers, Phase shifts, Halftones, Mask making, Semiconductors, Electron beam lithography

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Proceedings Article | 17 December 2003 Paper

Cell projection EB exposure for Giga DRAM device mask

Jae Cheon Shin, Munki Lim, Youngmo Lee, Bo-Kyung Choi, Yongkyoo Choi, Oscar Han

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518332

KEYWORDS: Silicon, Photomasks, Semiconducting wafers, Etching, Electron beams, Vestigial sideband modulation, Beam shaping, Chemistry, Photoresist processing, Silicon films

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Showing 5 of 6 publications

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