Mrs. Jae-Cheon Shin
at Hynix Semiconductor Inc
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | October 29, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Lithography, Etching, Chromium, Image analysis, Transmittance, Photomasks, Extreme ultraviolet, Nanoimprint lithography, Semiconducting wafers, Binary data

PROCEEDINGS ARTICLE | May 26, 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Reticles, Scanners, Manufacturing, Inspection, Reflectivity, Scanning electron microscopy, Data processing, Photomasks, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | October 30, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Semiconductors, Electron beams, Etching, Dry etching, Reliability, Chromium, Scanning electron microscopy, Process control, Photomasks, Critical dimension metrology

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Electron beam lithography, Etching, Dry etching, Reliability, Chromium, Scanning electron microscopy, Photomasks, Critical dimension metrology, Photoresist processing, Phase shifts

PROCEEDINGS ARTICLE | August 20, 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Semiconductors, Electron beam lithography, Manufacturing, Photomasks, Mask making, Critical dimension metrology, Halftones, Photoresist processing, Semiconducting wafers, Phase shifts

PROCEEDINGS ARTICLE | December 17, 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Electron beams, Etching, Silicon, Chemistry, Silicon films, Photomasks, Beam shaping, Photoresist processing, Semiconducting wafers, Vestigial sideband modulation

Showing 5 of 6 publications
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