Dr. Jae-Heon Kim
at Hynix Semiconductor Inc
SPIE Involvement:
Publications (5)

Proceedings Article | 23 March 2012 Paper
Keundo Ban, Junggun Heo, Hyunkyung Shim, Minkyung Park, Kilyoung Lee, Sunyoung Koo, Jaeheon Kim, Cheolkyu Bok, Myoungsoo Kim, Hyosang Kang
Proceedings Volume 8322, 83221A (2012) https://doi.org/10.1117/12.916119
KEYWORDS: Double patterning technology, Extreme ultraviolet lithography, Extreme ultraviolet, Critical dimension metrology, Line width roughness, Photomasks, Optical lithography, Etching, Metrology, Edge roughness

Proceedings Article | 16 April 2011 Paper
Kilyoung Lee, Cheolkyu Bok, Jaeheon Kim, Byounghoon Lee, Jongsik Bang, Hyunkyung Shim, Sungjin Kim, James Moon, Donggyu Yim, Sung-Ki Park
Proceedings Volume 7972, 79720P (2011) https://doi.org/10.1117/12.880906
KEYWORDS: Optical lithography, Photomasks, Critical dimension metrology, Nanoimprint lithography, Chromium, Etching, Double patterning technology, Scanners, Image processing, Photoresist developing

Proceedings Article | 29 March 2011 Paper
Proceedings Volume 7969, 796906 (2011) https://doi.org/10.1117/12.879766
KEYWORDS: Line width roughness, Extreme ultraviolet lithography, Data modeling, Photomasks, Calibration, Extreme ultraviolet, Point spread functions, Lithography, Photoresist materials, Stochastic processes

Proceedings Article | 31 March 2010 Paper
Kilyoung Lee, Cheolkyu Bok, Jaeheon Kim, Hyunkyung Shim, Junggun Heo, Junghyung Lee, Hyeong-Soo Kim, Donggu Yim, Sung-Ki Park
Proceedings Volume 7639, 76391S (2010) https://doi.org/10.1117/12.846388
KEYWORDS: Optical lithography, Double patterning technology, Image processing, Photoresist processing, Lithography, Etching, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Coating

Proceedings Article | 4 December 2008 Paper
Hee-Youl Lim, Kyo-Young Jang, Jae-Heon Kim, Sung-Gu Lee, Sarohan Park, Tae-Hwan Kim, Cheol-Kyu Bok, Seung-Chan Moon
Proceedings Volume 7140, 714020 (2008) https://doi.org/10.1117/12.804657
KEYWORDS: Double patterning technology, Lithography, Photomasks, Etching, Photoresist materials, Optical lithography, Image processing, Coating, Scanning electron microscopy, Extreme ultraviolet

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