Dr. Jae-Heon Kim
at Hynix Semiconductor Inc
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 23 March 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Metrology, Optical lithography, Etching, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Double patterning technology, Critical dimension metrology, Edge roughness

Proceedings Article | 16 April 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Optical lithography, Etching, Image processing, Scanners, Chromium, Photomasks, Double patterning technology, Nanoimprint lithography, Critical dimension metrology, Photoresist developing

Proceedings Article | 29 March 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Point spread functions, Data modeling, Calibration, Photoresist materials, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Stochastic processes

Proceedings Article | 31 March 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Optical lithography, Etching, Image processing, Coating, Extreme ultraviolet lithography, Double patterning technology, Critical dimension metrology, Photoresist processing, Semiconducting wafers

Proceedings Article | 4 December 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Optical lithography, Etching, Image processing, Coating, Scanning electron microscopy, Photoresist materials, Photomasks, Extreme ultraviolet, Double patterning technology

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top