Mr. Jae-Hun Park Profile

Jae-Hun Park

at Hanyang Univ

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 7 November 2018 Presentation

Extreme ultraviolet pellicle cooling by hydrogen gas flow (Conference Presentation)

Hye-Lim Lee, Sung-Gyu Lee, Jae-Hun Park, Hye-Keun Oh

Proceedings Volume 10809, 108091B (2018) https://doi.org/10.1117/12.2502731

KEYWORDS: Pellicles, Extreme ultraviolet, Hydrogen, Extreme ultraviolet lithography, Finite element methods

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Proceedings Article | 11 October 2018 Paper

A possible wafer heating during EUV exposure

Se-Hun Oh, Sung-Gyu Lee, Jae-Hun Park, Chung-Hyun Ban, Hye-Keun Oh

Proceedings Volume 10809, 108091R (2018) https://doi.org/10.1117/12.2502918

KEYWORDS: Extreme ultraviolet, Infrared radiation, Semiconducting wafers, Extreme ultraviolet lithography, Finite element methods, Lithography, Optical lithography, EUV optics, Reflectivity, Wafer-level optics

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Proceedings Article | 22 March 2018 Paper

Thermomechanical changes of EUV mask and absorber dependency

Chung-Hyun Ban, Sung-Gyu Lee, Eun-Sang Park, Jae-Hun Park, Hye-Keun Oh

Proceedings Volume 10583, 1058322 (2018) https://doi.org/10.1117/12.2299495

KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Finite element methods, Computer simulations, Multilayers, Image processing, Semiconducting wafers, Tantalum, Nickel

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SPIE Journal Paper | 29 December 2017

Thermo-optical optimization of extreme-ultraviolet pellicles for future generations

Eun-Sang Park, Chung-hyun Ban, Jae-Hun Park, Hye-Keun Oh

JM3, Vol. 16, Issue 04, 041014, (December 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.4.041014

KEYWORDS: Pellicles, Extreme ultraviolet, Coating, Ruthenium, Silicon, Extreme ultraviolet lithography, Absorption, Photomasks, Finite element methods, Multilayers

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Proceedings Article | 16 October 2017 Paper

Lifetime estimation of extreme-ultraviolet pellicle at 500 W source power by thermal stress analysis

Eun-Sang Park, Chung-Hyun Ban, Jae-Hun Park, Hye-Keun Oh

Proceedings Volume 10450, 104501K (2017) https://doi.org/10.1117/12.2280518

KEYWORDS: Pellicles, Extreme ultraviolet, Coating, Extreme ultraviolet lithography, Silicon, Finite element methods, Graphene, Manufacturing, Ruthenium, Absorption

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