Jae-Hwan Kim
at Semiconductor Leading Edge Technologies Inc
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | June 26, 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Lithography, Monochromatic aberrations, Silicon, Transmittance, Photomasks, Optical simulations, Optical proximity correction, Reactive ion etching, Photoresist processing, Resolution enhancement technologies

PROCEEDINGS ARTICLE | June 26, 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Semiconductors, Lithography, Monochromatic aberrations, Reticles, Wavefronts, Wavefront aberrations, Photomasks, Computer aided design, Critical dimension metrology, Semiconducting wafers

SPIE Journal Paper | October 1, 2002
JM3 Vol. 1 Issue 03
KEYWORDS: Birefringence, Lithography, Monochromatic aberrations, Semiconducting wafers, Imaging systems, Resolution enhancement technologies, Reticles, Wavefronts, Photomasks, Computer aided design

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