Jae-Pil Shin
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | March 16, 2016
Proc. SPIE. 9781, Design-Process-Technology Co-optimization for Manufacturability X
KEYWORDS: Semiconductors, Electronics, Statistical analysis, Visualization, Etching, Manufacturing, Inspection, Nondestructive evaluation, Bridges, Neodymium, Semiconducting wafers, Design for manufacturability

PROCEEDINGS ARTICLE | June 30, 2012
Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX
KEYWORDS: Neck, Lithography, Scattering, Databases, Data processing, Distributed computing, Extreme ultraviolet, Optical proximity correction, Binary data, Electronic design automation

PROCEEDINGS ARTICLE | May 27, 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Target detection, Edge detection, Error analysis, Inspection, Scanning electron microscopy, Photomasks, Mask making, Critical dimension metrology, Binary data

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Data modeling, Visualization, Computing systems, Software development, Photomasks, Optical proximity correction, Data centers, Model-based design, Standards development, Resolution enhancement technologies

PROCEEDINGS ARTICLE | May 20, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Electronics, Logic, Cadmium, Etching, Control systems, Bridges, Photomasks, Logic devices, Critical dimension metrology, Process engineering

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Lithography, Cadmium, Error analysis, Artificial neural networks, Neural networks, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Resolution enhancement technologies

Showing 5 of 7 publications
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