Claire Baek
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Publications (4)

SPIE Journal Paper | September 19, 2014
JM3 Vol. 13 Issue 04
KEYWORDS: Scatterometry, Finite element methods, Inspection, Metrology, Diffraction gratings, Scanning electron microscopy, Diffraction, Critical dimension metrology, Computing systems, Manufacturing

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Diffraction, Metrology, Statistical analysis, Manufacturing, Inspection, Computer simulations, Scanning electron microscopy, Scatterometry, Finite element methods, Diffraction gratings

PROCEEDINGS ARTICLE | April 10, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Mathematical modeling, Metrology, Statistical analysis, Scanning electron microscopy, Scatterometry, Process control, Semiconductor manufacturing, Critical dimension metrology, Semiconducting wafers, Statistical modeling

PROCEEDINGS ARTICLE | April 5, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Metrology, Statistical analysis, Data modeling, Error analysis, Manufacturing, Scanning electron microscopy, Time metrology, Plasma etching, Semiconductor manufacturing, Semiconducting wafers

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