Dr. Jaehyuk Chang
at Univ of Wisconsin-Madison
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 6 December 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Semiconductors, Oxides, Electron beam lithography, Etching, Silicon, Photomasks, Mask making, Semiconducting wafers, Projection lithography, Device simulation

Proceedings Article | 2 June 2004
Proc. SPIE. 5504, 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Wafer-level optics, Refractive index, Microfluidics, Polymers, Refraction, Optical simulations, Immersion lithography, Semiconducting wafers, Liquids, Absorption

Proceedings Article | 2 June 2004
Proc. SPIE. 5504, 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Lithography, Reticles, Polymers, Distortion, Pellicles, Refraction, Fluorine, Semiconducting wafers, Overlay metrology, Polymer thin films

Proceedings Article | 20 May 2004
Proc. SPIE. 5374, Emerging Lithographic Technologies VIII
KEYWORDS: Lithography, Electrodes, Silicon, 3D modeling, Printing, Photomasks, Mask making, Semiconducting wafers, Charged-particle lithography, Device simulation

Proceedings Article | 16 June 2003
Proc. SPIE. 5037, Emerging Lithographic Technologies VII
KEYWORDS: Lithography, Optical lithography, Distortion, 3D modeling, Extreme ultraviolet, Extreme ultraviolet lithography, Convection, Semiconducting wafers, Performance modeling, Thermal modeling

Showing 5 of 7 publications
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