Jaisun Kyoung
at Hanyang Univ
SPIE Involvement:
Publications (5)

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Polymers, Glasses, Diffusion, Surface roughness, Monte Carlo methods, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, Photoresist processing

Proceedings Article | 24 March 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Ellipsometry, Lithography, Phase modulation, Polarization, Air contamination, Ultraviolet radiation, Crystals, Inspection, Pellicles, Photomasks

Proceedings Article | 5 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Ellipsometry, Refractive index, Optical properties, Imaging systems, Water, Ultraviolet radiation, Spectroscopic ellipsometry, Immersion lithography, Liquids, Absorption

Proceedings Article | 15 March 2006
Proc. SPIE. 6155, Data Analysis and Modeling for Process Control III
KEYWORDS: Ellipsometry, Optical lithography, Polarization, Calibration, Scanning electron microscopy, Photoresist materials, Process control, Spectroscopic ellipsometry, Process modeling, Anisotropy

Proceedings Article | 9 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Semiconductors, Ellipsometry, Reticles, Air contamination, Spectroscopy, Inspection, Atomic force microscopy, Spectroscopic ellipsometry, Transmittance, Photomasks

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