Jake Kaminsky
SPIE Involvement:
Publications (5)

Proceedings Article | 6 April 2020 Presentation + Paper
Proceedings Volume 11323, 113230V (2020) https://doi.org/10.1117/12.2551727
KEYWORDS: Line edge roughness, Lithography, Etching, Amorphous silicon, Extreme ultraviolet, Oxidation, Extreme ultraviolet lithography, Optical lithography, Scanning electron microscopy, Critical dimension metrology

SPIE Journal Paper | 23 July 2018
Steven Grzeskowiak, Jake Kaminsky, Sean Gibbons, Amrit Narasimhan, Robert Brainard, Greg Denbeaux
JM3, Vol. 17, Issue 03, 033501, (July 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.3.033501
KEYWORDS: Polymers, Extreme ultraviolet lithography, Extreme ultraviolet, Photoresist materials, Molecules, Absorbance, Chemical reactions, Absorption, Spectroscopy, Electrodes

Proceedings Article | 28 March 2018 Paper
Jake Kaminsky, Steven Grzeskowiak, Sean Gibbons, Jonathan Chandonait, Ulrich Welling, Lawrence Melvin, Yudhishthir Kandel, Robert Brainard, Greg Denbeaux
Proceedings Volume 10586, 105861N (2018) https://doi.org/10.1117/12.2297386
KEYWORDS: Photoresist materials, Extreme ultraviolet lithography, Ionizing radiation, Radiation effects, Electrons, Photons, Polymers, Extreme ultraviolet, Photoresist developing, Standards development

Proceedings Article | 21 March 2018 Presentation + Paper
Steven Grzeskowiak, Jake Kaminsky, Sean Gibbons, Michael Murphy, Jonathan Chandonait, Robert Brainard, Greg Denbeaux
Proceedings Volume 10586, 105860D (2018) https://doi.org/10.1117/12.2297692
KEYWORDS: Electrons, Polymers, Extreme ultraviolet lithography, Molecules, Extreme ultraviolet, Absorbance, Absorption, Photoresist materials, Polymethylmethacrylate, Liquids

Proceedings Article | 27 March 2017 Paper
Steven Grzeskowiak, Amrit Narasimhan, Michael Murphy, Christian Ackerman, Jake Kaminsky, Robert Brainard, Greg Denbeaux
Proceedings Volume 10146, 101462C (2017) https://doi.org/10.1117/12.2274128
KEYWORDS: Extreme ultraviolet lithography, Photoresist materials, Spectroscopy, Extreme ultraviolet, FT-IR spectroscopy, Absorption, Absorption spectroscopy, Lithography, Mass spectrometry, Electrons, Silicon, Hydrogen, Molecules, Photodiodes

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