Jake Kaminsky
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 6 April 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Line edge roughness, Lithography, Etching, Amorphous silicon, Extreme ultraviolet, Oxidation, Extreme ultraviolet lithography, Optical lithography, Scanning electron microscopy, Critical dimension metrology

SPIE Journal Paper | 23 July 2018
JM3 Vol. 17 Issue 03
KEYWORDS: Polymers, Extreme ultraviolet lithography, Extreme ultraviolet, Photoresist materials, Molecules, Absorbance, Chemical reactions, Absorption, Spectroscopy, Electrodes

Proceedings Article | 28 March 2018 Paper
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Photoresist materials, Extreme ultraviolet lithography, Ionizing radiation, Radiation effects, Electrons, Photons, Polymers, Extreme ultraviolet, Photoresist developing, Standards development

Proceedings Article | 21 March 2018 Presentation + Paper
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Electrons, Polymers, Extreme ultraviolet lithography, Molecules, Extreme ultraviolet, Absorbance, Absorption, Photoresist materials, Polymethylmethacrylate, Liquids

Proceedings Article | 27 March 2017 Paper
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Extreme ultraviolet lithography, Photoresist materials, Spectroscopy, Extreme ultraviolet, FT-IR spectroscopy, Absorption, Absorption spectroscopy, Lithography, Mass spectrometry, Electrons, Silicon, Hydrogen, Molecules, Photodiodes

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