James F. Bonafede
Senior Manager at Cymer
SPIE Involvement:
Publications (5)

Proceedings Article | 13 June 2022 Presentation
Proceedings Volume PC12051, PC120510B (2022) https://doi.org/10.1117/12.2615263
KEYWORDS: Imaging systems, Process control, Photoresist materials, Lithography, 3D image processing, Semiconducting wafers, Scanners, Overlay metrology, Optical lithography, Image processing

Proceedings Article | 18 March 2019 Presentation
Proceedings Volume 10961, 109610J (2019) https://doi.org/10.1117/12.2515725
KEYWORDS: Critical dimension metrology, Light sources, Semiconducting wafers, Yield improvement, Deep ultraviolet, Scanners, Control systems, Source mask optimization

Proceedings Article | 16 March 2009 Paper
Proceedings Volume 7274, 72742Q (2009) https://doi.org/10.1117/12.813987
KEYWORDS: SRAF, Logic devices, Critical dimension metrology, Optical simulations, Laser stabilization, Light sources, Combined lens-mirror systems, Computer simulations, Laser cutting, Tolerancing

Proceedings Article | 11 April 2008 Paper
Proceedings Volume 6924, 69242K (2008) https://doi.org/10.1117/12.771628
KEYWORDS: Critical dimension metrology, Laser stabilization, Optical simulations, Nanoimprint lithography, Logic devices, Beam controllers, Chromatic aberrations, Lens design, Laser cutting, Light sources

Proceedings Article | 12 March 2008 Paper
Proceedings Volume 6924, 69241S (2008) https://doi.org/10.1117/12.771942
KEYWORDS: Imaging systems, Scanners, Optical proximity correction, Line width roughness, Control systems, Wavefronts, Optical lithography, Double patterning technology, Reticles, Metrology

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