James F. Bonafede
Senior Manager Application Dept at
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Light sources, Computer simulations, Laser stabilization, Optical simulations, Laser cutting, Logic devices, SRAF, Critical dimension metrology, Tolerancing, Combined lens-mirror systems

PROCEEDINGS ARTICLE | April 11, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Chromatic aberrations, Light sources, Lens design, Laser stabilization, Optical simulations, Laser cutting, Logic devices, Nanoimprint lithography, Critical dimension metrology, Beam controllers

PROCEEDINGS ARTICLE | March 12, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Reticles, Metrology, Optical lithography, Imaging systems, Scanners, Wavefronts, Control systems, Line width roughness, Double patterning technology, Optical proximity correction

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