James F. Bonafede
Senior Manager Application Dept
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 18 March 2019
Proc. SPIE. 10961, Optical Microlithography XXXII
KEYWORDS: Light sources, Deep ultraviolet, Scanners, Control systems, Source mask optimization, Critical dimension metrology, Semiconducting wafers, Yield improvement

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Light sources, Computer simulations, Laser stabilization, Optical simulations, Laser cutting, Logic devices, SRAF, Critical dimension metrology, Tolerancing, Combined lens-mirror systems

Proceedings Article | 11 April 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Chromatic aberrations, Light sources, Lens design, Laser stabilization, Optical simulations, Laser cutting, Logic devices, Nanoimprint lithography, Critical dimension metrology, Beam controllers

Proceedings Article | 12 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Reticles, Metrology, Optical lithography, Imaging systems, Scanners, Wavefronts, Control systems, Line width roughness, Double patterning technology, Optical proximity correction

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top