Dr. James A. Bruce
Senior Engineer & Scientist
SPIE Involvement:
Author
Area of Expertise:
lithography , OPC , OPC Verification , simulation
Publications (14)

SPIE Journal Paper | 1 October 2010
JM3 Vol. 9 Issue 04
KEYWORDS: Electrical breakdown, Optical proximity correction, Failure analysis, Semiconducting wafers, Lithography, Image processing, Optical simulations, Wafer-level optics, Optical components, Critical dimension metrology

Proceedings Article | 2 April 2010 Paper
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Optical components, Lithography, Optical lithography, Image processing, Optical simulations, Optical proximity correction, Semiconducting wafers, Failure analysis, Process modeling, Electrical breakdown

Proceedings Article | 4 March 2008 Paper
Proc. SPIE. 6925, Design for Manufacturability through Design-Process Integration II
KEYWORDS: Reticles, Data modeling, Calibration, Etching, Metals, Diffusion, Optical proximity correction, Semiconducting wafers, Failure analysis, Electrical breakdown

Proceedings Article | 16 November 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Lithography, Data modeling, Image processing, Scanning electron microscopy, Photoresist materials, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Failure analysis

Proceedings Article | 4 April 2007 Paper
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Defect detection, Inspection, Printing, Monte Carlo methods, Image quality, Photomasks, Optical proximity correction, Semiconducting wafers, Resolution enhancement technologies, Defect inspection

Showing 5 of 14 publications
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