Dr. James F. Cameron
Fellow at Dow Electronic Materials
SPIE Involvement:
Author
Publications (34)

SPIE Journal Paper | June 22, 2018
JM3 Vol. 17 Issue 02
KEYWORDS: Atomic force microscopy, Line edge roughness, Photoresist processing, Photoresist developing, Image processing, Standards development, Photoresist materials, Optical lithography, Polymers, Pulmonary function tests

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Lithography, Etching, Dry etching, Polymers, Reflectivity, Ion implantation

PROCEEDINGS ARTICLE | March 21, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Polymers, Scanners, Extreme ultraviolet lithography, Immersion lithography, Standards development, 193nm lithography

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Carbon, Lithography, Diffusion, Surface roughness, Interferometry, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, Semiconducting wafers

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Lithography, Polymers, Spectroscopy, Silicon, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Neodymium, Radiation effects, Polymer thin films

PROCEEDINGS ARTICLE | March 29, 2013
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Lithography, Electrodes, Polymers, Diffusion, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Stochastic processes, Chemically amplified resists

Showing 5 of 34 publications
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