James B. Claypool
Research Engineer at Missouri Univ of Science & Technology
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 2 April 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Multilayers, Etching, Silicon, Reflectivity, Photomasks, Plasma etching, Semiconducting wafers, System on a chip, Plasma

Proceedings Article | 4 May 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Lithographic illumination, Polarization, Reflectivity, Electroluminescence, Scanning electron microscopy, Line width roughness, Immersion lithography, Line edge roughness, Semiconducting wafers

Proceedings Article | 12 June 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Lithography, Polymers, Molecules, Silicon, Reflectivity, Chromophores, Silicon films, Critical dimension metrology, Semiconducting wafers, Bottom antireflective coatings

Proceedings Article | 24 July 2002
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Lithography, Optical properties, Etching, Polymers, Reflectivity, Photoresist materials, Absorbance, Critical dimension metrology, 193nm lithography, Bottom antireflective coatings

Proceedings Article | 24 July 2002
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Lithography, Antireflective coatings, Multilayers, Optical lithography, Etching, Resistance, Reflectivity, Photoresist materials, Absorbance, Bottom antireflective coatings

Showing 5 of 11 publications
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