Dr. James P. DeYoung
Director of Research at Micell Technologies Inc
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 11 April 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Standards development, Semiconducting wafers, Extreme ultraviolet, Chemistry, Photoresist developing, Line width roughness, Photoresist processing, Extreme ultraviolet lithography, Image processing, Photoresist materials

Proceedings Article | 11 April 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Line width roughness, Semiconducting wafers, Standards development, Extreme ultraviolet, Critical dimension metrology, Line edge roughness, Image processing, Image analysis, Software development, Scanning electron microscopy

Proceedings Article | 11 April 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Photoresist materials, Photoresist developing, Standards development, Semiconducting wafers, Polymers, Crystals, Quartz, Extreme ultraviolet, Photoresist processing, Extreme ultraviolet lithography

Proceedings Article | 11 April 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Standards development, Diffractive optical elements, Line width roughness, Extreme ultraviolet, Photoresist developing, Statistical analysis, Photoresist materials, Line edge roughness, Temperature metrology, Carbon dioxide

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