James E. Ellenson
Research and Development Engineer at Hewlett-Packard Co
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Optical lithography, Switching, Electrodes, Metals, Ultraviolet radiation, CMOS technology, Nanoimprint lithography, Reactive ion etching, Hybrid circuits, Nanowires

Proceedings Article | 30 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Semiconductors, Lithography, Polymers, Ultraviolet radiation, Particles, Chemistry, Photomasks, Extreme ultraviolet lithography, Nanoimprint lithography, Semiconducting wafers

Proceedings Article | 9 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Microelectromechanical systems, Lithography, Electron beam lithography, Manufacturing, Transform theory, Photomasks, Nanoimprint lithography, Semiconducting wafers, Optics manufacturing, Vestigial sideband modulation

Proceedings Article | 6 May 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Nanotechnology, Lithography, Electron beam lithography, Optical lithography, Inspection, Photomasks, Semiconductor manufacturing, Extreme ultraviolet lithography, Nanoimprint lithography, Optical alignment

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