James C. Foster
Sr. Applications Engineer at ASML US Inc
SPIE Involvement:
Publications (6)

Proceedings Article | 26 June 2003 Paper
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485428
KEYWORDS: Scanning electron microscopy, Scanners, Image processing, Transistors, Manufacturing, Monochromatic aberrations, High volume manufacturing, Optical lithography, Spherical lenses, Semiconductors

Proceedings Article | 30 July 2002 Paper
Arnie Ford, Greg Hughes, Cesar Garza, Paul Dewa, Kevin Cummings, Jeff Meute, Peter Dirksen, Daniel Miller, Kim Dean, Azeddine Zerrade, Will Conley, James Webb, Susan MacDonald, Bruce Smith, Shashikant Patel, Marco Moers, Victoria Graffenberg, Georgia Rich, James Foster
Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474551
KEYWORDS: Photomasks, Monochromatic aberrations, Scanning electron microscopy, Image processing, Lithography, Manufacturing, Imaging systems, Wavefronts, Zernike polynomials, Edge detection

Proceedings Article | 14 September 2001 Paper
Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435749
KEYWORDS: Monochromatic aberrations, Scanners, Scanning electron microscopy, Transistors, Lithography, Semiconducting wafers, Deep ultraviolet, Critical dimension metrology, Semiconductors, Phase measurement

Proceedings Article | 5 July 2000 Paper
David Witko, Thomas Harris, Ludo van der Heijden, John Cossins, Jan Kuijten, Douglas Ritchie, James Foster
Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389079
KEYWORDS: Scanners, Deep ultraviolet, Semiconducting wafers, Distortion, Optical alignment, Overlay metrology, Lithography, Manufacturing, Photoresist materials, Reticles

Proceedings Article | 17 May 1994 Paper
Craig Sager, William Rericha, James Foster, Richard Rogoff, Richard Holscher, J. Brett Rolfson, Patrick Reynolds, Barton Katz
Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175437
KEYWORDS: Lithography, Computer aided design, Manufacturing, Photomasks, Reticles, Phase shifts, Lithium, Design for manufacturability, Binary data, Photoresist materials

Showing 5 of 6 publications
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