James C. Foster
Sr. Applications Engineer at ASML US Inc
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 26 June 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Semiconductors, Monochromatic aberrations, Optical lithography, Image processing, Scanners, Manufacturing, Scanning electron microscopy, Transistors, High volume manufacturing, Spherical lenses

Proceedings Article | 30 July 2002
Proc. SPIE. 4691, Optical Microlithography XV
KEYWORDS: Lithography, Monochromatic aberrations, Edge detection, Imaging systems, Image processing, Manufacturing, Wavefronts, Scanning electron microscopy, Zernike polynomials, Photomasks

Proceedings Article | 14 September 2001
Proc. SPIE. 4346, Optical Microlithography XIV
KEYWORDS: Semiconductors, Lithography, Monochromatic aberrations, Deep ultraviolet, Scanners, Scanning electron microscopy, Transistors, Phase measurement, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 5 July 2000
Proc. SPIE. 4000, Optical Microlithography XIII
KEYWORDS: Lithography, Reticles, Deep ultraviolet, Scanners, Manufacturing, Distortion, Photoresist materials, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 17 May 1994
Proc. SPIE. 2197, Optical/Laser Microlithography VII
KEYWORDS: Lithography, Reticles, Lithium, Manufacturing, Photoresist materials, Photomasks, Computer aided design, Binary data, Phase shifts, Design for manufacturability

Proceedings Article | 8 August 1993
Proc. SPIE. 1927, Optical/Laser Microlithography
KEYWORDS: Oxides, Lithography, Optical lithography, Metals, Lens design, Photoresist materials, Photomicroscopy, Photoresist processing, Semiconducting wafers, Product engineering

Showing 5 of 6 publications
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