James Guerrero
Field Applications Engineer at
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | March 22, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Data modeling, Calibration, Image processing, Error analysis, Scanning electron microscopy, Time metrology, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 15, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Photovoltaics, Logic, Optical lithography, Lithographic illumination, Sensors, Etching, Metals, Electroluminescence, Photomasks, Source mask optimization, Computational lithography, Optical proximity correction, Critical dimension metrology, Resolution enhancement technologies

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Lithography, Monochromatic aberrations, Optical lithography, Lithographic illumination, Interferometers, Metals, Error analysis, Critical dimension metrology, Semiconducting wafers, Yield improvement

PROCEEDINGS ARTICLE | September 14, 2001
Proc. SPIE. 4346, Optical Microlithography XIV
KEYWORDS: Lithography, Reticles, Optical lithography, Imaging systems, Interferometers, Wavefronts, Semiconducting wafers, Systems modeling, Overlay metrology, Personal protective equipment

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