Dr. James E. Harvey
Senior Optical Engineer at Photon Engineering LLC
SPIE Involvement:
Conference Program Committee | Track Chair | Author | Editor | Instructor
Publications (92)

Proceedings Article | 9 September 2019
Proc. SPIE. 11115, UV/Optical/IR Space Telescopes and Instruments: Innovative Technologies and Concepts IX
KEYWORDS: Diffraction, Telescopes, Astronomy, Polarization, Coronagraphy, Exoplanets, Space telescopes, Transmittance, Astronomical telescopes, Optical instrument design

SPIE Journal Paper | 28 August 2019
OE Vol. 58 Issue 08

SPIE Press Book | 31 July 2019

Proceedings Article | 17 September 2018
Proc. SPIE. 10745, Current Developments in Lens Design and Optical Engineering XIX
KEYWORDS: Diffraction, Point spread functions, Telescopes, Mirrors, Segmented mirrors, Stars, Exoplanets, Image quality, Space telescopes, Optical instrument design

Proceedings Article | 6 July 2018
Proc. SPIE. 10698, Space Telescopes and Instrumentation 2018: Optical, Infrared, and Millimeter Wave
KEYWORDS: Telescopes, Mirrors, Stars, Sensors, Particles, Surface roughness, Exoplanets, Space telescopes, Planets, James Webb Space Telescope

Showing 5 of 92 publications
Conference Committee Involvement (21)
Current Developments in Lens Design and Optical Engineering XXI
23 August 2020 | San Diego, California, United States
Current Developments in Lens Design and Optical Engineering XX
12 August 2019 | San Diego, California, United States
Current Developments in Lens Design and Optical Engineering XIX
21 August 2018 | San Diego, California, United States
Optical Fabrication, Testing, and Metrology VI
15 May 2018 | Frankfurt, Germany
Current Developments in Lens Design and Optical Engineering XVIII
7 August 2017 | San Diego, California, United States
Showing 5 of 21 Conference Committees
Course Instructor
SC383: Understanding X-Ray Imaging Systems
This course provides a basic understanding of X-ray imaging systems and the fundamental physical mechanisms that limit image quality. A complete engineering systems analysis is presented. The relative effect of these mechanisms upon image quality is discussed for a variety of applications including soft X-ray microscopy, high-energy astrophysics, X-ray microlithography, and X-ray synchrotron beam lines.
SC377: Non-Paraxial Scalar Diffraction Theory: Application to Gratings and Surface Scatter Phenomena
In this short course, a linear systems approach to modeling non-paraxial scalar diffraction theory is developed and shown to be shift-invariant with respect to changes in incident angle only when expressed in terms of the direction cosines of the propagation vectors. It is the diffracted radiance (not intensity or irradiance) that is shift-invariant in direction cosine space. This realization extends the range of parameters over which simple Fourier techniques can be used to make accurate calculations concerning wide-angle diffraction phenomena. Diffraction grating behavior and surface scattering effects are two applications that are not limited to the paraxial region and benefit greatly from this new development.
SC136: Astronomical Optics for Astronomers
After an explanation of astronomical optics from Galileo to the Hubble Space Telescope, the geometrical theory of image formation is reviewed. The image degradation effects of diffraction, geometrical aberrations, and scattering are presented with emphasis on obtaining physical insight while retaining some degree of mathematical rigor. A systems approach to image formation leads to a discussion of various image quality criteria appropriate for different applications. Optical transfer function (OTF) in optical performance analysis is discussed for diffraction-limited situations and optical fabrication and environmental errors. The characteristics of reflective telescope configurations are discussed in detail.
SC570: UV/EUV and X-ray Optics
This course provides a basic understanding of UV/EUV and X-ray optical systems and the fundamental physical mechanisms that limit image quality. A complete systems engineering analysis is presented. The relative effect of these mechanisms upon image quality is discussed for a variety of applications including soft X-ray microscopy, high-energy astrophysics, EUV/X-ray microlithography, and X-ray synchrotron beam lines.
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