Mr. James Lamb Profile

James Lamb

Deputy CTO- Adv Semiconductor Mnf at Brewer Science Inc

SPIE Involvement:

Author

Publications (16)

Proceedings Article | 23 March 2020 Presentation + Paper

Are surfaces of silicon hardmasks adaptive?

Xianggui (Shawn) Ye, Joyce Lowes, Zhimin Zhu, Richard Daugherty, Zhiqiang Fan, James Lamb, Tim Limmer, Srikanth Kommu

Proceedings Volume 11326, 1132616 (2020) https://doi.org/10.1117/12.2552929

KEYWORDS: Photoresist materials, Interfaces, Lithography, Silicon, Semiconducting wafers, Computer simulations, Multilayers, Surface properties

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Proceedings Article | 23 March 2020 Presentation + Paper

Rigorous vase data fitting for ultrathin films

Zhimin Zhu, Joyce Lowes, Shawn Ye, Zhiqiang Fan, Darin Collins, James Lamb, Tim Limmer

Proceedings Volume 11327, 113270J (2020) https://doi.org/10.1117/12.2551934

KEYWORDS: Algorithm development, Semiconducting wafers, Polymer thin films, Polymers, Software development, Optics manufacturing, Scattering, Thin films, Lithography, Coating

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Proceedings Article | 20 March 2019 Presentation + Paper

Thin film characterization for advanced patterning

Zhimin Zhu, Xianggui Ye, Sean Simmons, Catherine Frank, Tim Limmer, James Lamb

Proceedings Volume 10961, 109610H (2019) https://doi.org/10.1117/12.2515078

KEYWORDS: Thin films, Polymers, Optical lithography, Polymer thin films, Lithography, Stochastic processes, Absorption, Reflectivity, Etching, Interfaces

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Proceedings Article | 25 June 2014 Paper

Novel remote sensor systems: design, prototyping, and characterization

V. Kayastha, S. Gibbons, J. Lamb, R. Giedd

Proceedings Volume 9083, 90832U (2014) https://doi.org/10.1117/12.2050706

KEYWORDS: Sensors, Transceivers, Temperature metrology, Antennas, Receivers, Environmental sensing, Transmitters, Electronic filtering, Prototyping, Magnetism

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Proceedings Article | 24 August 2001 Paper

New fast-etching bottom antireflective coatings for 248-nm lithography

Rama Puligadda, Runhui Huang, Chris Cox, James Lamb, Manuel Arjona, James Claypool

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436916

KEYWORDS: Etching, Photoresist materials, Reflectivity, Coating, Optical properties, Polymers, Deep ultraviolet, Bottom antireflective coatings, Lithography, Manufacturing

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Proceedings Article | 24 August 2001 Paper

Development of full-fill bottom antireflective coatings for dual-damascene process

Yubao Wang, Xiaoming Wu, Gu Xu, James Lamb, John Sullivan, James Claypool, Jackie Backus, Sean Trautman, Xie Shao, Satoshi Takei, Yasuhisa Sone, Kenichi Mizusawa, Hiroyoshi Fukuro

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436917

KEYWORDS: Coating, Etching, Photoresist materials, Semiconducting wafers, Bottom antireflective coatings, Antireflective coatings, Lithography, Thin films, Critical dimension metrology, Deep ultraviolet

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Proceedings Article | 20 October 2000 Paper

Optimization of the planarizing performance of a DUV organic bottom antireflective coating for via first dual-damascene process: cooperation to achieve material and process characterization

Paul Williams, Alice Martin, Marlene Strobl, William Roberts, Francis Goodwin, Lars Voelkel, Axel Feicke, Sean Trautman, James Lamb

Proceedings Volume 4226, (2000) https://doi.org/10.1117/12.404853

KEYWORDS: Semiconducting wafers, Etching, Manufacturing, Deep ultraviolet, Coating, Metals, Materials processing, Bottom antireflective coatings, Photomasks, Lithography

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Proceedings Article | 2 June 2000 Paper

Advancements in organic antireflective coatings for dual-damascene processes

Shreeram Deshpande, Xie Shao, James Lamb, Nickolas Brakensiek, Joe Johnson, Xiaoming Wu, Gu Xu, William Simmons

Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386539

KEYWORDS: Etching, Optical lithography, Metals, Photoresist processing, Copper, Dielectrics, Critical dimension metrology, Photomasks, Semiconductor manufacturing, Semiconductors

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Proceedings Article | 14 June 1999 Paper

Broadband planarizing antireflective coating for i-line, DUV, and 193-nm microlithographic applications

Xie Shao, James Lamb, James Claypool, William Simmons, Earnest Murphy

Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350877

KEYWORDS: Reflectivity, Etching, Critical dimension metrology, Photoresist materials, Polymers, Prototyping, Coating, Deep ultraviolet, Lithography, Oxides

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Proceedings Article | 29 June 1998 Paper

Deep-ultraviolet antireflective coating with improved conformality, optical density, and etch rate

Douglas Guerrero, James Meador, Gu Xu, Hitoshi Suzuki, Yasuhisa Sone, Vandana Krishnamurthy, James Claypool, James Lamb

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312412

KEYWORDS: Etching, Photoresist materials, Absorbance, Reflectivity, Deep ultraviolet, Critical dimension metrology, Chemistry, Lithography, Coating, Antireflective coatings

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Proceedings Article | 29 June 1998 Paper

Bottom-ARC optimization methodology for 0.25-um lithography and beyond

Maaike Op de Beeck, Geert Vandenberghe, Patrick Jaenen, Feng-Hong Zhang, Christie Delvaux, Paul Richardson, Ilse van Puyenbroeck, Kurt Ronse, James Lamb, Johan van der Hilst, Johannes van Wingerden

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310762

KEYWORDS: Critical dimension metrology, Etching, Reflectivity, Semiconducting wafers, Chlorine, Ions, Lithography, Photoresist processing, Absorption, Information operations

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Proceedings Article | 8 June 1998 Paper

Fast-etch antireflective coating for sub-0.35-um i-line microlithography applications

Paul Williams, Xie Shao, James Lamb, Colin Hester, Tony Flaim

Proceedings Volume 3332, (1998) https://doi.org/10.1117/12.308762

KEYWORDS: Etching, Photoresist materials, Lithography, Coating, Standards development, Reflectivity, Bottom antireflective coatings, Absorbance, Manufacturing, Radon

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Proceedings Article | 14 June 1996 Paper

Highly absorbing ARC for DUV lithography

Edward Pavelchek, James Meador, Douglas Guerrero, James Lamb, Ajit Kache, Manuel doCanto, Timothy Adams, David Stark, Daniel Miller

Proceedings Volume 2724, (1996) https://doi.org/10.1117/12.241867

KEYWORDS: Photoresist materials, Etching, Coating, Absorbance, Silicon, Oxides, Lithography, Deep ultraviolet, Antireflective coatings, Reflectivity

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Proceedings Article | 7 June 1996 Paper

Postexposure baking-temperature effect on resist profile with bottom antireflective coating

Chang-Ming Dai, Chin-Lung Lin, She-Chang Tai, James Lamb, Masaru Iida

Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240985

KEYWORDS: Photoresist materials, Reflectivity, Optical lithography, Photoresist processing, Semiconducting wafers, Lithography, Bottom antireflective coatings, Photoresist developing, Diffusion, Electroluminescence

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Proceedings Article | 1 June 1992 Paper

Enhancement of deep-UV patterning integrity and process control using antireflective coating

Bruce Dudley, Susan Jones, Charles Peters, David Koester, Gregg Barnes, Tony Flaim, James Lamb

Proceedings Volume 1672, (1992) https://doi.org/10.1117/12.59774

KEYWORDS: Reflectivity, Deep ultraviolet, Tungsten, Semiconducting wafers, Low pressure chemical vapor deposition, Antireflective coatings, Chemical vapor deposition, Thin films, Scanning electron microscopy, Photomicroscopy

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Proceedings Article | 1 July 1991 Paper

Use of antireflective coatings in deep-UV lithography

Satyendra Sethi, Romelia Distasio, David Ziger, James Lamb, Tony Flaim

Proceedings Volume 1463, (1991) https://doi.org/10.1117/12.44772

KEYWORDS: Antireflective coatings, Reflectivity, Semiconducting wafers, Lithography, Excimer lasers, Oxides, Deep ultraviolet, Etching, Aluminum, Tungsten

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Showing 5 of 16 publications

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