Mr. James Lee Profile

James Lee

at ASML Korea Co Ltd

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 10 April 2024 Presentation + Paper

Improving EUV sub-40nm via single patterning using wavefront and pupil co-optimization

Soojung Kim, No Young Chung, Kwangseok Maeng, Hyunjae Cho, Jerry Lim, Hyungrok Jang, Jae Hyoung Kim, Insung Kim, Eelco van Setten, Hidde Keizers, Ajinkya Patil, Steven Beekmans, Jungtae Lee, Ki-Seok Kim, James Lee, Sung-Woon Park, Jialei Tang, Stephen Hsu, Youping Zhang, Paul Derks

Proceedings Volume 12953, 1295306 (2024) https://doi.org/10.1117/12.3009878

KEYWORDS: Wavefronts, Extreme ultraviolet, Extreme ultraviolet lithography, Light sources and illumination, Stochastic processes, Diffraction, Optical lithography, Source mask optimization, Projection systems

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Proceedings Article | 10 April 2024 Poster + Paper

Diffraction-based metrology for dose monitoring and control

Young Sung Kim, JongHyun Lee, SangHyun Lee, Kwangseok Maeng, JaeHyoung Kim, InSung Kim, SungWoon Uh, Eric Janda, Ajinkya Patil, SuYeun Baek, SeongYong Cho, James Lee

Proceedings Volume 12955, 129553E (2024) https://doi.org/10.1117/12.3010991

KEYWORDS: Semiconducting wafers, Metrology, Critical dimension metrology, Diffraction, Scanners, Dose control, Design, Wafer level optics, Optical sensing, Diffraction gratings

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Proceedings Article | 20 March 2020 Paper

Enabling accurate and robust optical metrology of in device overlay

Min-Seok Kang, Chan Hwang, Seungyoon Lee, Jeongjin Lee, Joon-Soo Park, Christian Leewis, Eun-Ji Yang, Do-Haeng Lee, James Lee, Sabil Huda, Noh-Kyoung Park, Anagnostis Tsiatmas, Giulio Bottegal, Amy Wang, Filippo Belletti, Jan Jitse Venselaar, Giacomo Miceli, Izabela Saj, Sam Chen

Proceedings Volume 11325, 1132529 (2020) https://doi.org/10.1117/12.2553446

KEYWORDS: Overlay metrology, Semiconducting wafers, Metrology, Measurement devices, Optical metrology, Etching, Scanners, Diffractive optical elements, Wafer testing, Optical testing

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Proceedings Article | 20 March 2020 Presentation + Paper

Understanding advanced DRAM edge placement error budget and opportunities for control

Jaeseung Jeong, Jinho Lee, Jinsun Kim, Sunyoung Yea, Chan Hwang, Seung Yoon Lee, Jeongjin Lee, Joonsoo Park, Peter Nikolsky, Daniel Park, Antonio Corradi, Hyun-Woo Yu, Sun-Wook Jung, Denis Ovchinnikov, Vadim Timoshkov, Isabel de la Fuente Valentin, Yuxiang Yin, Kaustubh Padhye, Wim Tel, Harm Dillen, Koen Thuijs, Daan Slotboom, Miao Wang, Rhys Su, Marc Kea, Jin-Woo Lee, Yun-A Sung, Sang-Uk Kim, Young-Hoon Song, James Lee, Oh-Sung Kwon

Proceedings Volume 11325, 1132506 (2020) https://doi.org/10.1117/12.2551997

KEYWORDS: Metrology, Critical dimension metrology, Semiconducting wafers, Stochastic processes, Optical lithography, Etching, Lithography, Edge roughness

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