Dr. James N. McNames
Associate Professor at Portland State Univ
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | May 17, 2005
Proc. SPIE. 5755, Data Analysis and Modeling for Process Control II
KEYWORDS: Signal to noise ratio, Statistical analysis, Detection and tracking algorithms, Sensors, Manufacturing, Inspection, Monte Carlo methods, Semiconductor manufacturing, Algorithm development, Semiconducting wafers

PROCEEDINGS ARTICLE | May 17, 2005
Proc. SPIE. 5755, Data Analysis and Modeling for Process Control II
KEYWORDS: Reticles, Optical lithography, Statistical analysis, Data modeling, Etching, Photomasks, Semiconductor manufacturing, Optimization (mathematics), Semiconducting wafers, Process modeling

PROCEEDINGS ARTICLE | May 17, 2005
Proc. SPIE. 5755, Data Analysis and Modeling for Process Control II
KEYWORDS: Oxides, Statistical analysis, Data modeling, Etching, Error analysis, Process control, Plasma etching, Semiconducting wafers, Wafer testing, Plasma

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