Dr. James Jaein Moon
Principal Engineer at ASML
SPIE Involvement:
Publications (22)

SPIE Journal Paper | 30 January 2024
Jiuning Hu, Adam Lyons, Chris Spence, Kurt Wampler, Mahmoud Mohsen, Yen-Wen Lu, Rachit Gupta, Youping Zhang, Rafael Howell, Jiyoon Chang, James Moon, Jun Ye
JM3, Vol. 23, Issue 01, 011204, (January 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.1.011204
KEYWORDS: Microchannel plates, Optical proximity correction, Lithography, Extreme ultraviolet, Deep ultraviolet, Solids, SRAF, Metals, Photovoltaics, Data storage

Proceedings Article | 28 March 2017 Paper
Jookyoung Song, Jaeseung Choi, Chanha Park, Hyunjo Yang, Daekwon Kang, Minsu Oh, Manjae Park, James Moon, Jun Ye, Stanislas Baron
Proceedings Volume 10148, 1014813 (2017) https://doi.org/10.1117/12.2257872
KEYWORDS: Optical proximity correction, Photomasks, Manufacturing, Atrial fibrillation, Optical lithography, Model-based design, Lithography, Defect detection, Source mask optimization, Semiconducting wafers

Proceedings Article | 13 March 2012 Paper
Mihye Kim, James Moon, Byoung-sub Nam, Se-young Oh, Hyun-jo Yang, Donggyu Yim
Proceedings Volume 8326, 83262C (2012) https://doi.org/10.1117/12.916137
KEYWORDS: Optical proximity correction, Photomasks, Photoresist processing, Process modeling, Semiconductors, Lithography, Optical lithography, Calibration, Source mask optimization, Extreme ultraviolet lithography

Proceedings Article | 16 April 2011 Paper
Kilyoung Lee, Cheolkyu Bok, Jaeheon Kim, Byounghoon Lee, Jongsik Bang, Hyunkyung Shim, Sungjin Kim, James Moon, Donggyu Yim, Sung-Ki Park
Proceedings Volume 7972, 79720P (2011) https://doi.org/10.1117/12.880906
KEYWORDS: Optical lithography, Photomasks, Critical dimension metrology, Nanoimprint lithography, Chromium, Etching, Double patterning technology, Scanners, Image processing, Photoresist developing

Proceedings Article | 29 March 2011 Paper
Proceedings Volume 7969, 796906 (2011) https://doi.org/10.1117/12.879766
KEYWORDS: Line width roughness, Extreme ultraviolet lithography, Data modeling, Photomasks, Calibration, Extreme ultraviolet, Point spread functions, Lithography, Photoresist materials, Stochastic processes

Showing 5 of 22 publications
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