Dr. James Jaein Moon
at SK Hynix Inc
SPIE Involvement:
Author
Publications (20)

Proceedings Article | 13 March 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Semiconductors, Lithography, Optical lithography, Calibration, Photomasks, Extreme ultraviolet lithography, Source mask optimization, Optical proximity correction, Photoresist processing, Process modeling

Proceedings Article | 16 April 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Optical lithography, Etching, Image processing, Scanners, Chromium, Photomasks, Double patterning technology, Nanoimprint lithography, Critical dimension metrology, Photoresist developing

Proceedings Article | 29 March 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Point spread functions, Data modeling, Calibration, Photoresist materials, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Stochastic processes

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Optical lithography, Image processing, Electroluminescence, Scanning electron microscopy, Photomasks, Double patterning technology, Mask making, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Electroluminescence, Scanning electron microscopy, Photomasks, Optical proximity correction, SRAF, Mask making, Semiconducting wafers, Wafer testing, Performance modeling

Showing 5 of 20 publications
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