Dr. James Oberschmidt
Engineer at
SPIE Involvement:
Author
Publications (21)

Proceedings Article | 18 March 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Mathematical modeling, Metrology, Surface plasmons, Optical lithography, Data modeling, Calibration, Optical proximity correction, Semiconducting wafers, Integrated circuit design, Statistical modeling

Proceedings Article | 31 March 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Surface plasmons, Optical lithography, Data modeling, Calibration, Image processing, Printing, Image quality, Optical proximity correction, Statistical modeling, Process modeling

Proceedings Article | 12 April 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Diffraction, Data modeling, Calibration, Metals, Error analysis, 3D modeling, Photomasks, Optical proximity correction, Critical dimension metrology, Performance modeling

Proceedings Article | 23 May 2011
Proc. SPIE. 8081, Photomask and Next-Generation Lithography Mask Technology XVIII
KEYWORDS: Wafer-level optics, Lithography, Data modeling, Polarization, Calibration, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Process modeling

Proceedings Article | 20 May 2011
Proc. SPIE. 8081, Photomask and Next-Generation Lithography Mask Technology XVIII
KEYWORDS: Computer simulations, SRAF, Electronic design automation, Resolution enhancement technologies, Current controlled current source

Proceedings Article | 4 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Metrology, Data modeling, Calibration, Image processing, Computer simulations, Optical proximity correction, Photoresist processing, Statistical modeling, Process modeling

Showing 5 of 21 publications
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