Dr. James S. Papanu
Member Technical Staff
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Particles, Chemistry, Nondestructive evaluation, Photomasks, SRAF, Cavitation, Acoustics, Spherical lenses, Mask cleaning, Liquids

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Particles, Chemistry, Inspection, Nondestructive evaluation, Chromium, Scanning electron microscopy, Latex, Photomasks, Mask cleaning, Liquids

Proceedings Article | 21 June 2006
Proc. SPIE. 6281, 22nd European Mask and Lithography Conference
KEYWORDS: Particles, Chemistry, Reflectivity, Chromium, Photoresist materials, Attenuators, Photomasks, Ozone, Photoresist processing, Photoresist developing

Proceedings Article | 5 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Particles, Chemistry, Chromium, Photoresist materials, Transmittance, Photomasks, Photoresist processing, Mask cleaning, Plasma, Phase shifts

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