Dr. James E. Potzick
Physicist at National Institute of Standards and Technology
SPIE Involvement:
Author | Instructor
Publications (33)

Proceedings Article | 20 April 2011 Paper
Proceedings Volume 7971, 79710T (2011) https://doi.org/10.1117/12.881620
KEYWORDS: Silicon, Overlay metrology, Scanning electron microscopy, Optical microscopes, Metrology, 3D acquisition, 3D metrology, Polarization, 3D modeling, Photomasks

Proceedings Article | 2 April 2010 Paper
Proceedings Volume 7638, 76381U (2010) https://doi.org/10.1117/12.851008
KEYWORDS: Tolerancing, Metrology, Image processing, Microscopes, Process control, Standards development, Manufacturing, Photomasks, Feedback loops, Data modeling

Proceedings Article | 30 September 2009 Paper
R. Quintanilha, B. Barnes, Y. Sohn, L. Howard, R. Silver, J. Potzick, M. Stocker
Proceedings Volume 7488, 74881L (2009) https://doi.org/10.1117/12.829693
KEYWORDS: Microscopes, Photomasks, Calibration, Metrology, Ultraviolet radiation, Charge-coupled devices, Standards development, Quartz, Wafer-level optics, Polarization

Proceedings Article | 23 September 2009 Paper
B. Bodermann, D. Bergmann, E. Buhr, W. Hässler-Grohne, H. Bosse, J. Potzick, R. Dixson, R. Quintanilha, M. Stocker, A. Vladar, N. Orji
Proceedings Volume 7488, 74881H (2009) https://doi.org/10.1117/12.831373
KEYWORDS: Photomasks, Scanning electron microscopy, Standards development, Metrology, Ultraviolet radiation, Microscopes, Atomic force microscopy, Calibration, Critical dimension metrology, Microscopy

Proceedings Article | 23 March 2009 Paper
Proceedings Volume 7272, 727218 (2009) https://doi.org/10.1117/12.815363
KEYWORDS: Photomasks, Microscopes, Metrology, Chromium, Scanning electron microscopy, Calibration, Semiconducting wafers, Optical microscopes, Wafer-level optics, Scatterometry

Showing 5 of 33 publications
Conference Committee Involvement (4)
Photomask Technology
19 September 2011 | Monterey, California, United States
Photomask Technology
13 September 2010 | Monterey, California, United States
Photomask Technology
15 September 2009 | Monterey, California, United States
Process and Materials Characterization and Diagnostics in IC Manufacturing II
27 February 2003 | Santa Clara, CA, United States
Course Instructor
SC854: Nanoscale Photomask Metrology - Theory and Practice
This course provides attendees with a basic working knowledge of the principles of metrology, with emphasis on measuring the size or placement of features on IC wafers and photomasks. The course covers the metrology concepts defined by ISO (the International Organization for Standardization) and used by national metrology laboratories around the world, and shows how to reduce these concepts to practice in a research or manufacturing environment. Practical examples will be given.
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