Dr. James E. Potzick
Physicist at National Institute of Standards and Technology
SPIE Involvement:
Author | Instructor
Publications (33)

Proceedings Article | 20 April 2011 Paper
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Optical microscopes, Metrology, 3D acquisition, Polarization, Silicon, 3D modeling, Scanning electron microscopy, 3D metrology, Photomasks, Overlay metrology

Proceedings Article | 2 April 2010 Paper
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Microscopes, Metrology, Data modeling, Image processing, Manufacturing, Process control, Photomasks, Feedback loops, Tolerancing, Standards development

Proceedings Article | 30 September 2009 Paper
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Wafer-level optics, Microscopes, Metrology, Polarization, Calibration, Quartz, Ultraviolet radiation, Photomasks, Charge-coupled devices, Standards development

Proceedings Article | 23 September 2009 Paper
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Microscopes, Metrology, Calibration, Ultraviolet radiation, Microscopy, Atomic force microscopy, Scanning electron microscopy, Photomasks, Critical dimension metrology, Standards development

Proceedings Article | 23 March 2009 Paper
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Wafer-level optics, Microscopes, Optical microscopes, Metrology, Calibration, Chromium, Scanning electron microscopy, Scatterometry, Photomasks, Semiconducting wafers

Showing 5 of 33 publications
Conference Committee Involvement (4)
Photomask Technology
19 September 2011 | Monterey, California, United States
Photomask Technology
13 September 2010 | Monterey, California, United States
Photomask Technology
15 September 2009 | Monterey, California, United States
Process and Materials Characterization and Diagnostics in IC Manufacturing II
27 February 2003 | Santa Clara, CA, United States
Course Instructor
SC854: Nanoscale Photomask Metrology - Theory and Practice
This course provides attendees with a basic working knowledge of the principles of metrology, with emphasis on measuring the size or placement of features on IC wafers and photomasks. The course covers the metrology concepts defined by ISO (the International Organization for Standardization) and used by national metrology laboratories around the world, and shows how to reduce these concepts to practice in a research or manufacturing environment. Practical examples will be given.
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