Dr. James W. Thackeray
Research Fellow
SPIE Involvement:
Author
Area of Expertise:
polymer chemistry , photoresists , lithography , Anti Reflective coatings
Profile Summary

Dr Thackeray was honored in 2017 to become Fellow member of SPIE for his significant service to SPIE and the greater science community, as well as his noteworthy technical achievements in photoresist materials for semiconductor lithography. He has been instrumental in the development of numerous photoresist and antireflective coating materials for ultraviolet (UV), deep-UV, and extreme UV (EUV) lithography. His work developing chemically amplified photoresists and his invention of a KrF-wavelength antireflection coating for lithography were extremely important both commercially and scientifically for the semiconductor industry. Currently, he leads development on the next generation of resist materials for sub-20-nm semiconductor devices that feature low line-edge roughness.

Thackeray has been granted 72 U.S. patents and twice won the Otto Haas Award, the highest award for scientific achievement at Rohm and Haas (now Dow Electronic Materials). Dr Thackeray has a Ph. D in Chemistry from the Massachusetts Institute of Technology. . He is a member of the American Chemical Society (ACS), the Polymeric Materials Science Engineering Division of ACS, and has been member of SPIE for more than 20 years.
Publications (54)

Proceedings Article | 24 March 2020 Presentation
Proc. SPIE. 11326, Advances in Patterning Materials and Processes XXXVII

Proceedings Article | 25 March 2019 Presentation + Paper
Proc. SPIE. 10960, Advances in Patterning Materials and Processes XXXVI
KEYWORDS: Lithography, Diffractive optical elements, Image processing, Diffusion, Image resolution, Image analysis, Line width roughness, Nanoimprint lithography, Photoresist processing, Temperature metrology

Proceedings Article | 25 March 2019 Presentation + Paper
Proc. SPIE. 10960, Advances in Patterning Materials and Processes XXXVI
KEYWORDS: Lithography, Optical lithography, Etching, Argon, Polymers, Resistance, Reflectivity, Photoresist materials, Critical dimension metrology, System on a chip

Proceedings Article | 23 March 2018 Presentation + Paper
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Scanning electron microscopy, Line width roughness

Proceedings Article | 27 March 2017 Presentation + Paper
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Electron beam lithography, Refractive index, Polymers, Photoresist materials, Polymerization, Extreme ultraviolet, Absorbance, Extreme ultraviolet lithography, Semiconducting wafers, Polymer thin films

Showing 5 of 54 publications
Conference Committee Involvement (6)
Advances in Patterning Materials and Processes XXXVI
25 February 2019 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXV
27 February 2018 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXIV
28 February 2017 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXIII
29 February 2016 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXII
24 February 2015 | San Jose, California, United States
Showing 5 of 6 Conference Committees
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