James E. Vasek
Manager
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 7 March 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Electron beam lithography, Reticles, Data modeling, Calibration, Scanning electron microscopy, Photomasks, Optical proximity correction, Semiconducting wafers, Process modeling

Proceedings Article | 4 March 2008 Paper
Proc. SPIE. 6925, Design for Manufacturability through Design-Process Integration II
KEYWORDS: Lithography, Data modeling, Calibration, Manufacturing, Fourier transforms, Photomasks, Optical proximity correction, Critical dimension metrology, Photoresist processing, Fiber optic illuminators

Proceedings Article | 12 April 2007 Paper
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Metrology, Detection and tracking algorithms, Data modeling, Visualization, Calibration, Databases, Scanning electron microscopy, Optical proximity correction, Semiconducting wafers, Process modeling

Proceedings Article | 28 March 2007 Paper
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Metrology, Data modeling, Calibration, Manufacturing, Scanning electron microscopy, Data processing, Optical proximity correction, Critical dimension metrology, Model-based design, Process modeling

Proceedings Article | 20 October 2006 Paper
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Reticles, Optical lithography, Manufacturing, Photomasks, Line width roughness, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

Showing 5 of 8 publications
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