Dr. James R. Wasson
Principal Staff Scientist
SPIE Involvement:
Publications (19)

Proceedings Article | 6 December 2004 Paper
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569318
KEYWORDS: Inspection, Photomasks, Defect inspection, Scanning electron microscopy, Extreme ultraviolet lithography, Extreme ultraviolet, Printing, Defect detection, Reflectivity, Multilayers

Proceedings Article | 20 May 2004 Paper
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.535503
KEYWORDS: Reflectivity, Extreme ultraviolet, Etching, Phase shifts, Photomasks, Extreme ultraviolet lithography, Silicon, Scattering, Lithography, Chemical species

Proceedings Article | 20 May 2004 Paper
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537366
KEYWORDS: Extreme ultraviolet lithography, Semiconducting wafers, Optical proximity correction, Lithography, Photomasks, Critical dimension metrology, Data modeling, Monte Carlo methods, Scanners, Scanning electron microscopy

SPIE Journal Paper | 1 April 2004
JM3, Vol. 3, Issue 02, (April 2004) https://doi.org/10.1117/12.10.1117/1.1668268
KEYWORDS: Photomasks, Reflectivity, Reticles, Semiconducting wafers, Reflection, Lithography, Quartz, Light scattering, Critical dimension metrology, Chromium

Proceedings Article | 17 December 2003 Paper
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.517893
KEYWORDS: Inspection, Phase shifts, Photomasks, Attenuators, Semiconducting wafers, Reflection, Lithography, Vacuum ultraviolet, Optical properties, Chromium

Showing 5 of 19 publications
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