Dr. James R. Wasson
Principal Staff Scientist at
SPIE Involvement:
Author
Publications (19)

Proceedings Article | 6 December 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Multilayers, Defect detection, Inspection, Reflectivity, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Defect inspection

Proceedings Article | 20 May 2004
Proc. SPIE. 5374, Emerging Lithographic Technologies VIII
KEYWORDS: Lithography, Data modeling, Scanners, Scanning electron microscopy, Monte Carlo methods, Photomasks, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 20 May 2004
Proc. SPIE. 5374, Emerging Lithographic Technologies VIII
KEYWORDS: Lithography, Scattering, Etching, Chemical species, Silicon, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Phase shifts

SPIE Journal Paper | 1 April 2004
JM3 Vol. 3 Issue 02
KEYWORDS: Photomasks, Reflectivity, Reticles, Semiconducting wafers, Reflection, Lithography, Quartz, Light scattering, Critical dimension metrology, Chromium

Proceedings Article | 17 December 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Electron beam lithography, Quartz, Ultraviolet radiation, Diffusion, Extreme ultraviolet lithography, Mask making, Lutetium, Critical dimension metrology, Photoresist processing, Semiconducting wafers

Proceedings Article | 17 December 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Reticles, Reflection, Quartz, Light scattering, Reflectivity, Chromium, Photomasks, Critical dimension metrology, Semiconducting wafers

Showing 5 of 19 publications
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