James Word
Director at Mentor Graphics Corp
SPIE Involvement:
Author
Publications (61)

SPIE Journal Paper | July 31, 2018
JM3 Vol. 18 Issue 01
KEYWORDS: SRAF, Photomasks, Metals, Extreme ultraviolet lithography, Personal protective equipment, Photovoltaics, Extreme ultraviolet, Image quality, Source mask optimization, Lithography

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Genetic algorithms, Printing, Photomasks, Source mask optimization, Optical proximity correction, SRAF, Critical dimension metrology, Optimization (mathematics), Semiconducting wafers

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Computing systems, Parallel processing, Data processing, Photomasks, Integrated circuits, Optical proximity correction, SRAF, Resolution enhancement technologies, Design for manufacturability

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Optical lithography, Metals, Image processing, Manufacturing, Printing, Image quality, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Optical proximity correction

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Optical lithography, Deep ultraviolet, Metals, Image processing, Manufacturing, Printing, Photomasks, Extreme ultraviolet, Source mask optimization, Optical proximity correction

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10588, Design-Process-Technology Co-optimization for Manufacturability XII
KEYWORDS: Lithography, Deep ultraviolet, Etching, Manufacturing, Printing, Photomasks, Extreme ultraviolet, Double patterning technology, Optical proximity correction, Model-based design

Showing 5 of 61 publications
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