Mr. James Word
Director at Mentor Graphics Corp
SPIE Involvement:
Author
Publications (60)

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Computing systems, Parallel processing, Data processing, Photomasks, Integrated circuits, Optical proximity correction, SRAF, Resolution enhancement technologies, Design for manufacturability

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Optical lithography, Metals, Image processing, Manufacturing, Printing, Image quality, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Optical proximity correction

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Optical lithography, Deep ultraviolet, Metals, Image processing, Manufacturing, Printing, Photomasks, Extreme ultraviolet, Source mask optimization, Optical proximity correction

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Genetic algorithms, Printing, Photomasks, Source mask optimization, Optical proximity correction, SRAF, Critical dimension metrology, Optimization (mathematics), Semiconducting wafers

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10588, Design-Process-Technology Co-optimization for Manufacturability XII
KEYWORDS: Optical lithography, Etching, Manufacturing, Printing, Photomasks, Double patterning technology, Optical proximity correction, SRAF

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10588, Design-Process-Technology Co-optimization for Manufacturability XII
KEYWORDS: Lithography, Deep ultraviolet, Etching, Manufacturing, Printing, Photomasks, Extreme ultraviolet, Double patterning technology, Optical proximity correction, Model-based design

Showing 5 of 60 publications
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